Source¶
The incident beam, produced, conditioned, and defined before the sample. The controllers that drive these devices are on the Controls page. Each device pairs its human name with its control handle, its key specs, and whether it is field replaceable. new marks a device not yet modeled in CORA; confirm marks a value taken from the docs that staff have not yet verified.
Generated from the descriptor
This page is generated from the descriptor at deployments/id28/beamline.yaml. Edit the descriptor, not this page.
| Property | Value |
|---|---|
| Facility | esrf |
| Sector | ID28 |
| Tier | Unit |
| Source | insertion-device (confirm: ID28 is an in-vacuum-undulator beamline; the BLISS config binds two undulators (IVU22a, IVU13-3c, modelled below); the exact period and segment count are SRC-1) |
Machine¶
The machine-level source state and the front end, observed not driven.
Enclosure: id28-optics.
Note
The ESRF-EBS storage-ring state, the loose StorageRing pattern reused across the fleet; the BLISS MachInfo and the front-end shutter are read from machine/machine.yml (MACHINE-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
StorageRing |
StorageRing |
BLISS machinfo (MachInfo, tango://acs:10000/fe/master/id28); the ESRF-EBS storage-ring state (current, fill, refill countdown), observe-only |
ESRF-EBS storage-ring state via the BLISS MachInfo on the front-end master; observe-only (MACHINE-1) | new confirm |
|
FrontEndShutter |
Shutter |
BLISS fe (TangoShutter, FrontEnd, acs.esrf.fr:10000/fe/master/id28) |
the ID28 front-end shutter; the upstream gate between the machine and the optics zone (PSS-1) | new confirm |
Insertion devices¶
The in-vacuum undulators, the hard X-ray source.
Enclosure: id28-optics.
Note
The two in-vacuum undulators bind the catalog InsertionDevice; the gap is the settable axis (machine/undulators.yml). The names imply 22 mm and 13 mm periods; the exact period and segment count are SRC-1.
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
Undulator |
InsertionDevice |
BLISS ESRF_Undulator (//acs:10000/id/master/id28); two in-vacuum segments IVU22a (gap u22gap, 11.1-300 mm) and IVU13-3c (gap u133gap, 11.1-300 mm) |
the two in-vacuum undulators (IVU22a + IVU13-3c) on the ESRF_Undulator device server; gap per segment (u22gap / u133gap), tracked with the incident energy; the period implied by the names (22 mm / 13 mm) and the segment detail are SRC-1 | new confirm |
Optics¶
The high-resolution backscattering monochromator, the incident-energy axis, the focusing mirrors, the beam-position monitor, and the beam-defining slits.
Enclosure: id28-optics.
Note
The main backscattering monochromator binds Monochromator (a Si crystal on the PI E518 piezo, pimth / pimchi); the meV incident energy is set by tuning the crystal temperature (the ASL F700 monot / deltae axis), carried as the BeamEnergy PseudoAxis. The config also shows a premono (OH1) and a postmono (OH2) ahead of the main mono (OH3); they fold into the same monochromation chain (MONO-1). The HFM / VFM benders bind Mirror; the oh2 Elettra monitor binds the graduated PositionMonitor Family; the primary and mono slits bind Slit.
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
Monochromator |
Monochromator |
BLISS PI_E518 (oh3/main_mono_pi_e518.yml; pimth / pimchi piezo on tcp e518id28, with pimth_enc / pimchi_enc encoders); a premono (OH1) and postmono (OH2) precede it in the chain |
the high-resolution backscattering monochromator (a Si crystal on a PI E518 piezo, pimth / pimchi); the backscattering reflection sets the meV resolution, a per-Asset setting; energy is scanned by crystal temperature, not Bragg angle (MONO-1) | new confirm |
|
BeamEnergy |
PseudoAxis |
BLISS F700 (oh3/asl_f700.yml; ASL F700 on gpibid28c pad 3, setpoint monot 7-23 C, energy deltae +/-800 keV, T0 22.854, LAMBDA 0.5226) |
incident-energy pseudo-axis realized by the ASL F700 backscattering-crystal temperature controller (monot setpoint -> deltae energy shift), not an angular mono; the meV energy-transfer scan is the IXS measurement (MONO-1) | new confirm |
|
HorizontalFocusingMirror |
Mirror |
BLISS hfm_ctrl (oh3/hfm.yml, HFM controller; benders hfmb1 / hfmb2, height hfmz1 / hfmz2, rotation hfmth, tiltz hfmtz -> transz hfmz / transy hfmy / tiltx hfmtx / bending hfmb) |
the horizontal focusing mirror (HFM, two-bender on the dedicated HFM calc controller) (OPT-1) | new confirm |
|
VerticalFocusingMirror |
Mirror |
BLISS vfm_ctrl (oh3/vfm.yml, VFM controller; benders vfmb1 / vfmb2, height vfmz1 / vfmz2 -> transz vfmz / bending vfmb) |
the vertical focusing mirror (VFM, two-bender on the dedicated VFM calc controller) (OPT-1) | new confirm |
|
BeamPositionMonitor |
PositionMonitor |
BLISS elettra_bpm_oh2 (oh2/elettra_bpm_oh2.yml; Elettra on tango://id28/elettra/oh2; quadrant currents ebpmc1..4, total ebpmct, position ebpmx / ebpmy) |
the oh2 Elettra beam-position monitor; binds the graduated PositionMonitor Family (DIAG-1) | new confirm |
|
PrimarySlit |
Slit |
BLISS slits_ph / slits_pv (slits/slit_phg.yml, slits/slit_pvg.yml; horizontal phg / pho on pr / pl, vertical pvg / pvo on pu / pd) |
the primary beam-defining slits ahead of the mono (horizontal + vertical gap / offset) (OPT-2) | new confirm |
|
MonoSlit |
Slit |
BLISS slits_mx (slits/slit_mxgap.yml; main-mono slit hgap mxgap / hoffset mxoff on mxr / mxl) |
the main-mono beam-defining slit (OPT-2) | new confirm |