Source¶
The incident beam, produced, conditioned, and defined before the sample. The controllers that drive these devices are on the Controls page. Each device pairs its human name with its control handle, its key specs, and whether it is field replaceable. new marks a device not yet modeled in CORA; confirm marks a value taken from the docs that staff have not yet verified.
Generated from the descriptor
This page is generated from the descriptor at deployments/i19/beamline.yaml. Edit the descriptor, not this page.
| Property | Value |
|---|---|
| Facility | diamond |
| Sector | Sector 19 |
| Tier | Unit |
| Source | insertion-device (confirm: i19 is an undulator beamline; dodal binds the undulator (UndulatorInKeV on SR19I-MO-SERVC-01) but not its period; the undulator detail is SRC-1) |
Machine¶
The machine-level source state, observed not driven.
Enclosure: i19-optics.
Note
dodal's Synchrotron device is the observe-only machine state, the loose StorageRing pattern reused from the Diamond siblings (MACHINE-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
StorageRing |
StorageRing |
confirm: Diamond storage-ring state (current, fill); observe-only, the exact PVs are MACHINE-1 |
Diamond storage-ring state; observe-only (MACHINE-1) | new confirm |
Optics¶
The shared optics line: the undulator, the double-crystal monochromator, the focusing mirrors, the attenuator, the incident-energy axis, and the optics shutter. Both hutches share these; only the active hutch may drive them (ACCESS-1).
Enclosure: i19-optics.
Note
All reuse existing catalog Families. These are SINGLE Assets in the shared optics enclosure; a non-active hutch may read them but not drive them, and the energy move is a coordinated procedure over the monochromator, undulator, and mirrors gated by the active-hutch permit (ACCESS-1). The mirror coating stripe is a hutch-keyed setting on the mirror (OPT-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
Undulator |
InsertionDevice |
SR19I-MO-SERVC-01: |
the undulator (UndulatorInKeV, energy-to-gap lookup); coordinated with the DCM on an energy move; period is SRC-1 | new confirm |
|
Monochromator |
Monochromator |
BL19I-MO-DCM-01: |
double-crystal monochromator (Si stationary crystal + pitch/roll crystal); energy / wavelength / Bragg / offset with d-spacing readback; a non-active hutch reads it read-only (ACCESS-1, MONO-1) | new confirm |
|
HorizontalFocusingMirror |
Mirror |
BL19I-OP-HFM-01: |
horizontal focusing mirror with a piezo fine-pitch; coating stripe (Si / Rh / Pt by energy band) is a hutch-keyed setting; the piezo write is access-gated (OPT-1, ACCESS-1) | new confirm |
|
VerticalFocusingMirror |
Mirror |
BL19I-OP-VFM-01: |
vertical focusing mirror with a piezo fine-pitch; coating stripe setting as the HFM (OPT-1) | new confirm |
|
Attenuator |
Filter |
BL19I-OP-ATTN-04: |
absorber-wedge attenuator (X / Y wedge motors, BL19I-OP-ATTN-04 / -05); reuses Filter (the i03 precedent); the wedge write is access-gated (ATTN-1, ACCESS-1) | new confirm |
|
BeamEnergy |
PseudoAxis |
confirm: incident-energy virtual axis over the DCM and the undulator (the access-controlled energy composite); the coordinated DCM + undulator + mirror-stripe move is gated by the active-hutch permit; partition rule and range are MONO-1 / ACCESS-1 |
incident-energy pseudo-axis over the DCM and undulator (the 2-BM beam-energy pattern); the coordinated cross-Asset move is the access-gated energy procedure (MONO-1, ACCESS-1) | new confirm |
|
OpticsShutter |
Shutter |
BL19I-PS-SHTR-01: |
the experiment shutter (InterlockedHutchShutter, PSS-interlocked); the per-hutch operate is access-gated, the interlock is an Enclosure permit concern (PSS-1, ACCESS-1) | new confirm |