Source¶
The incident beam, produced, conditioned, and defined before the sample. A walk along the source-stage devices; the sample and detection stages are documented as their own composed-fixture pages, the controllers that drive these devices are on the Controls page, and the supplies they draw on are in Operations. Each device pairs its human name with the EPICS handle, its key specs, and whether it is field replaceable. new marks a device not yet modeled in CORA; confirm marks a value taken from the docs that staff have not yet verified.
Generated from the descriptor
This page is generated from the descriptor at deployments/xfp/beamline.yaml. Edit the descriptor, not this page. For the CORA Asset model, settings, vendor catalog, drawings, and wiring, see Inventory.
| Property | Value |
|---|---|
| Facility | nsls2 |
| Sector | 17-BM |
| Tier | Unit |
| Source | bending-magnet (confirm: 17-BM is a bending-magnet source (the name and the white-beam footprinting design imply it), but the profile collection exposes no source / dipole device, only the ring-current PV SR:OPS-BI{DCCT:1}I:Real-I. Source identity is SRC-1) |
Enclosures¶
| Enclosure | Role | Facility | Permit signal |
|---|---|---|---|
xfp-optics |
optics-hutch | nsls2 |
confirm: PSS permit leaf not fully in the profile collection; only the front-end photon-shutter enable status (XF:17BM-PPS{Sh:FE} enabled_status) is read; the optics zone (FE:C17B, XF:17BM-OP / XF:17BMA-OP), the hutch grouping is ENC-1 (PSS-1) |
xfp-endstation |
experiment-hutch | nsls2 |
confirm: PSS permit leaf unknown; the footprinting endstations (XF:17BMA-ES:1, ES:2); the monochromatic XAS endstation ES:3 is out of scope (ENC-1, PSS-1, WHITE-1) |
Machine¶
The machine-level source state, observed not driven.
Enclosure: xfp-optics.
Note
Observe-only NSLS-II machine state, the loose StorageRing pattern reused from the NSLS-II siblings. 17-BM is a bending-magnet source, not an insertion device, so no InsertionDevice Asset (SRC-1, MACHINE-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
StorageRing |
StorageRing |
SR:OPS-BI{DCCT:1}I:Real-I |
NSLS-II storage-ring current, read as a beam-present suspender input; observe-only; the rest of the ring state is MACHINE-1; the 17-BM bending-magnet source detail is SRC-1 | new confirm |
Optics¶
The white / pink beam optics: the bendable front-end mirror, the white-beam and beam-defining slits, and the dose-rate filter wheel. There is no monochromator in the footprinting path.
Enclosure: xfp-optics.
Note
The footprinting beam is white / pink: the bendable mirror sets the cutoff and binds Mirror; the slits bind Slit; the eight-position Al filter wheel binds Filter (it sets the dose rate, with the pinhole apertures as a further attenuator, ATTN-1). The only monochromator in the source is a separate XAS endstation (ES:3), out of scope for footprinting (WHITE-1). Everything here reuses the catalog and coins nothing.
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
FrontEndMirror |
Mirror |
XF:17BM-OP{Mir:1-Ax:P}Mtr |
the bendable front-end mirror (horizontal / lift / pitch / yaw / roll plus a Bend focus axis and thermocouples) that takes the heat load and sets the high-energy cutoff of the white beam; coating and bend are OPT-1 | new confirm |
|
WhiteBeamSlit |
Slit |
FE:C17B-OP{Slt:1-Ax:T}Mtr |
the front-end white-beam slit (T / B / I / O blades with virtual size / center); defines the white-beam footprint (OPT-2) | new confirm |
|
DefiningSlit |
Slit |
XF:17BMA-OP{Slt:ADC-Ax:XGap}Mtr |
the ADC beam-defining slit; its horizontal gap (adcslits.xgap) sets the exposure window for the shutterless high-throughput fly mode (the PB / PDS white-beam slit shares the same anatomy); OPT-2, HT-1 | new confirm |
|
FilterWheel |
Filter |
XF:17BMA-ES:1{Fltr:1-Ax:Rot}Mtr |
the eight-position rotary aluminium filter wheel (0 / 25 / 76 / 152 / 203 / 305 / 508 / 762 um Al) that attenuates the white beam to set the dose RATE; a beam-defining pinhole stage and a 0-9 mm Al z-attenuator are further, intermittently-connected attenuators (ATTN-1) | new confirm |
Dose¶
The dose-delivery gating: the personnel and timed exposure shutters, and the delay generator that fires the millisecond fast shutter. Exposure time times flux times attenuation is the delivered dose.
Enclosure: xfp-optics.
Note
Footprinting dose is delivered by gating the white beam onto the sample. The personnel-protection and timed exposure shutters bind Shutter; the delay generator that fires the millisecond Uniblitz fast shutter binds TimingController (its opening-time setpoint is the dose time). Seconds-scale exposures are software-timed on the pre-shutter; millisecond exposures use the delay-generator-fired Uniblitz, or in the high-throughput fly mode the stage velocity through the defining slit sets the exposure (DOSE-1, HT-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
PhotonShutter |
Shutter |
XF:17BM-PPS{Sh:FE} |
the personnel-protection front-end photon shutter; its enabled-status leaf is interlock-gated (plans refuse to open it when disabled); the rest of the PSS search-and-secure leaves are PSS-1 | new confirm |
|
DoseShutter |
Shutter |
XF:17BMA-EPS{Sh:1} |
the equipment-protection pre-shutter, the workhorse timed-exposure shutter for seconds-scale dose (open, software-timed sleep, close); a separate inner DIODE sample shutter (XF:17BMA-CT{DIODE-Local:1}...) protects the sample (DOSE-1) | new confirm |
|
DoseTimer |
TimingController |
XF:17BMA-ES:2{DG:1} |
the DG535 delay generator that fires the millisecond Uniblitz fast shutter: a settable opening-time (bDelaySetAO, the source's exp_time, the dose time), a trigger mode, and a single-shot fire (genSingleShotTrigBO); the Uniblitz itself has no EPICS PV and is driven downstream of this timer (DOSE-1) | new confirm |