Source¶

The incident beam, produced, conditioned, and defined before the sample. A walk along the source-stage devices; the sample and detection stages are documented as their own composed-fixture pages, the controllers that drive these devices are on the Controls page, and the supplies they draw on are in Operations. Each device pairs its human name with the EPICS handle, its key specs, and whether it is field replaceable. new marks a device not yet modeled in CORA; confirm marks a value taken from the docs that staff have not yet verified.

Generated from the descriptor

This page is generated from the descriptor at deployments/six/beamline.yaml. Edit the descriptor, not this page. For the CORA Asset model, settings, vendor catalog, drawings, and wiring, see Inventory.

Property	Value
Facility	nsls2
Sector	Sector 2
Tier	Unit
Source	insertion-device (confirm: 2-ID elliptically-polarizing undulator (EPU) on SR:C02-ID:G1A{EPU:1}; gap + phase (polarization) axes; whether SIX shares a canted straight with a sibling beamline is TOPO-1, the EPU type/period is SRC-1)

Enclosures¶

Enclosure	Role	Facility	Permit signal
`2-ID-A`	optics-hutch	`nsls2`	confirm: PSS permit leaf not in source; front-end and photon shutters are XF:02ID-PPS{Sh:FE} and XF:02IDA-PPS{PSh} (PSS-1)
`2-ID-B`	optics-hutch	`nsls2`	confirm: PSS permit leaf unknown; photon shutter XF:02IDB-PPS{PSh} (PSS-1, ENC-1)
`2-ID-C`	optics-hutch	`nsls2`	confirm: PSS permit leaf unknown; whether A/B/C are one optics hutch or several is ENC-1
`2-ID-D`	experiment-hutch	`nsls2`	confirm: PSS permit leaf unknown; the RIXS endstation hutch (ENC-1)

Insertion devices¶

The elliptically-polarizing undulator source on the SR:C02-ID straight.

Enclosure: 2-ID-A.

Note

One InsertionDevice Asset; the EPU adds a phase (polarization) axis beyond gap, carried as a setting (SRC-1). Whether the straight is canted with a sibling beamline is TOPO-1.

Name	Family	PV	Key specs	Replaceable	Status
`Undulator`	`InsertionDevice`	`SR:C02-ID:G1A{EPU:1}`	elliptically-polarizing undulator (gap + phase); type and period are SRC-1, the polarization-phase DOF is carried as a setting not a separate Family		`new` `confirm`

Optics¶

The first mirror, the front-end slit, the polarization diagnostic, and the front-end / photon shutters.

Enclosure: 2-ID-A.

Note

M1 is the first horizontal-deflecting mirror; diagon is the soft X-ray polarization diagnostic (DIAG-1).

Name	Family	PV	Key specs	Status
`Mirror_1`	`Mirror`	`XF:02IDA-OP{Mir:1-Ax:4`	first mirror M1; coatings and axis roles are OPT-1	`new` `confirm`
`FrontEndSlit`	`Slit`	`XF:02IDA-OP{Mir:1-Slt:4_D_1`	front-end baffle slit downstream of M1 (OPT-2)	`new` `confirm`
`PolarizationDiagnostic`	`GenericProbe`	`XF:02IDA-OP{Diag:1-Ax:3`	DIAGON soft X-ray polarization diagnostic; classification a placeholder (DIAG-1)	`new` `confirm`
`FrontEndShutter`	`Shutter`	`XF:02ID-PPS{Sh:FE}`	front-end safety shutter, PPS-gated	`new` `confirm`
`PhotonShutter_A`	`Shutter`	`XF:02IDA-PPS{PSh}`	2-ID-A photon shutter	`new` `confirm`

Monochromator¶

The plane-grating monochromator that selects the soft X-ray energy, and its slits.

Enclosure: 2-ID-B.

Note

pgm is the plane-grating monochromator (PGM): a premirror at a fixed-focus c-value (cff) plus an interchangeable grating (500 / 1200 / 1800 l/mm) set the energy. It binds the catalog GratingMonochromator Family (graduated across SIX + CSX), not the Monochromator Family (which is a crystal/multilayer Bragg DCM): a grating mono has no Bragg crystal and its resolution is set by the exit slit (MONO-1, see model.md).

Name	Family	PV	Key specs	Status
`Monochromator`	`GratingMonochromator`	energy: `XF:02IDB-OP{Mono:1-Ax:9_Eng}Mtr` cff: `XF:02IDB-OP{Mono:1-Ax:9_Cff}Mtr` grating_pitch: `XF:02IDB-OP{Mono:1-Ax:9_GP}Mtr` premirror_pitch: `XF:02IDB-OP{Mono:1-Ax:9_MP}Mtr` grating_translation: `XF:02IDB-OP{Mono:1-Ax:9_GT}Trans:Mtr`	plane-grating monochromator; three gratings 500/1200/1800 l/mm, energy range is MONO-1	`new` `confirm`
`MonoSlit_Upstream`	`Slit`	`XF:02IDB-OP{Mono:1-Slt:8_U_1`	upstream PGM baffle slit (OPT-2)	`new` `confirm`
`MonoSlit_Downstream`	`Slit`	`XF:02IDB-OP{Mono:1-Slt:9_D_1`	downstream PGM baffle slit (OPT-2)	`new` `confirm`
`PhotonShutter_B`	`Shutter`	`XF:02IDB-PPS{PSh}`	2-ID-B photon shutter	`new` `confirm`

Refocusing¶

The refocusing mirrors, their slits, and the exit slit that sets the energy resolution.

Enclosure: 2-ID-C.

Note

M3 and M4 are hexapod-mounted refocusing mirrors; extslt is the exit slit, the PGM resolution-defining element (OPT-1, OPT-2).

Name	Family	PV	Key specs	Status
`Mirror_3`	`Mirror`	`XF:02IDC-OP{Mir:3-Ax:13`	hexapod-mounted refocusing mirror M3 (OPT-1)	`new` `confirm`
`Mirror_4`	`Mirror`	`XF:02IDC-OP{Mir:4-Ax:18`	hexapod-mounted refocusing mirror M4 (OPT-1)	`new` `confirm`
`MirrorSlit_3`	`Slit`	`XF:02IDC-OP{Mir:3-Slt:12_U_1`	M3 baffle slit (OPT-2)	`new` `confirm`
`MirrorSlit_4`	`Slit`	`XF:02IDC-OP{Mir:4-Slt:18_U_1`	M4 baffle slit (OPT-2)	`new` `confirm`
`ExitSlit`	`Slit`	`XF:02IDC-OP{Slt:1-Ax:15`	exit slit; sets the PGM energy resolution (OPT-2)	`new` `confirm`