Source¶
The incident beam, produced, conditioned, and defined before the sample. A walk along the source-stage devices; the sample and detection stages are documented as their own composed-fixture pages, the controllers that drive these devices are on the Controls page, and the supplies they draw on are in Operations. Each device pairs its human name with the EPICS handle, its key specs, and whether it is field replaceable. new marks a device not yet modeled in CORA; confirm marks a value taken from the docs that staff have not yet verified.
Generated from the descriptor
This page is generated from the descriptor at deployments/ixs/beamline.yaml. Edit the descriptor, not this page. For the CORA Asset model, settings, vendor catalog, drawings, and wiring, see Inventory.
| Property | Value |
|---|---|
| Facility | nsls2 |
| Sector | Sector 10 |
| Tier | Unit |
| Source | insertion-device (confirm: 10-ID in-vacuum undulator IVU22 on SR:C10-ID:G1{IVU22:1}; gap axis. The undulator period/type and whether the 10-ID straight is canted with a sibling beamline are SRC-1 / TOPO-1) |
Enclosures¶
| Enclosure | Role | Facility | Permit signal |
|---|---|---|---|
10-ID-A |
optics-hutch | nsls2 |
confirm: PSS permit leaf not in source; the front-end and photon shutters and interlock tier are absent from the profile collection and are PSS-1 |
10-ID-B |
optics-hutch | nsls2 |
confirm: PSS permit leaf unknown; the high-resolution-mono hutch; whether A/B/C are one optics hutch or several is ENC-1 (PSS-1) |
10-ID-C |
optics-hutch | nsls2 |
confirm: PSS permit leaf unknown; transport optics zone (ENC-1, PSS-1) |
10-ID-D |
experiment-hutch | nsls2 |
confirm: PSS permit leaf unknown; the IXS endstation hutch (ENC-1, PSS-1) |
Insertion devices¶
The in-vacuum undulator source on the SR:C10-ID straight.
Enclosure: 10-ID-A.
Note
One InsertionDevice Asset; in-vacuum is a per-Asset setting (hxn / chx / srx precedent), not a Family split. Period and type are SRC-1.
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
Undulator |
InsertionDevice |
SR:C10-ID:G1{IVU22:1-Ax:Gap}-Mtr |
IVU22 in-vacuum undulator (gap); the incident-energy pseudo-axis tracks its gap against the DCM Bragg angle (SRC-1) | new confirm |
Machine¶
The machine-level source state and the source-orbit feedback, observed not driven.
Enclosure: 10-ID-A.
Note
Observe-only machine state, the loose StorageRing pattern reused from i22 / i03 / i15-1 (MACHINE-1). The undulator-orbit feedback has no clean motion Family and is carried family-less, modelling deferred (FEEDBACK-1, the i03 XBPMFeedback precedent).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
StorageRing |
StorageRing |
SR:OPS-BI{DCCT:1}I:Real-I |
storage-ring current (DCCT); observe-only machine state, not photon-path flux (MACHINE-1) | new confirm |
|
OrbitFeedback |
confirm: SR:UOFB{...} undulator-orbit feedback (id bump / nudge); modelling deferred, no Family coined at n=1 (FEEDBACK-1) |
source-orbit feedback construct; carried family-less pending a modelling decision (FEEDBACK-1) | new confirm |
Front end¶
The front-end beam-defining slit and the compound-refractive-lens transfocator.
Enclosure: 10-ID-A.
Note
The CRL transfocator reuses the graduated Transfocator catalog Family (a CRL focusing optic; 4-id / 8-id / 9-id / chx / i22); its x/y/th are Asset-layer settings.
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
FrontEndSlit |
Slit |
FE:C10A-OP{Slt: |
front-end beam-defining slit (blades + virtual centre/gap); axis roles are OPT-2 | new confirm |
|
Transfocator |
Transfocator |
x: FE:C10A-OP{CRL:1-Ax:X}Mtry: FE:C10A-OP{CRL:1-Ax:Y}Mtrth: FE:C10A-OP{CRL:1-Ax:P}Mtr |
front-end compound-refractive-lens transfocator; lens-stack composition is a setting | new confirm |
Monochromator¶
The double-crystal monochromator that selects the incident energy, its downstream slit and beam-position monitor, and the incident-energy pseudo-axes.
Enclosure: 10-ID-A.
Note
dcm is the Si(111) double-crystal Bragg monochromator: a crystal DCM binds the catalog Monochromator (unlike SIX's plane-grating PGM, which has no Bragg crystal and coined GratingMonochromator). The incident energy is a PseudoAxis: blE couples the DCM Bragg angle to the undulator gap, dcmE drives the DCM alone (MONO-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
Monochromator |
Monochromator |
theta: XF:10IDA-OP{Mono:DCM-Ax:P}Mtry: XF:10IDA-OP{Mono:DCM-Ax:Y}Mtrz2: XF:10IDA-OP{Mono:DCM-Ax:Z2}Mtr |
Si(111) double-crystal monochromator; crystal cut / d-spacing / energy range are MONO-1; the second-crystal offset z2 is a setting | new confirm |
|
IncidentEnergy |
PseudoAxis |
confirm: blE / dcmE virtual energy axes, 7.835-17.7 keV; blE = DCM Bragg + IVU22 gap tracking, dcmE = DCM only; the partition rule (arcsin(hc/2dE) + gap lookup) is MONO-1 |
incident-energy pseudo-axis over the DCM and undulator (the 2-BM beamline_energy_change pattern); MONO-1 | new confirm |
|
MonoSlit |
Slit |
XF:10IDA-OP{Slt:1 |
post-DCM beam-defining slit (OPT-2) | new confirm |
|
BeamPositionMonitor_A |
BeamPositionMonitor |
XF:10IDA-OP{BPM:1 |
10-ID-A beam-position monitor (x/y + diagnostic foil); NSLS-II-sibling choice (hxn), but the fleet is split with Diagnostic / GenericProbe (DIAG-1/BPM-1); the foil is a setting | new confirm |
High resolution mono¶
The high-resolution monochromator that sets the meV incident-energy resolution, its secondary source aperture, and the high-resolution energy pseudo-axis.
Enclosure: 10-ID-B.
Note
hrm2 is the high-resolution monochromator: anatomically still a crystal Bragg mono (up / down crystals), so it binds the catalog Monochromator as a second Asset. Resolution is a tunable setting, not a Family discriminator. The in-line beamstop is a candidate child BeamStop Asset (HRM-1). hrmE is the linear translation-to-energy pseudo-axis (MONO-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
HighResolutionMonochromator |
Monochromator |
up_offset: XF:10IDB-OP{Mono:HRM2-Ax:UTO}Mtrdown_offset: XF:10IDB-OP{Mono:HRM2-Ax:DTO}Mtr |
high-resolution crystal monochromator (HRM2, up / down crystals + picomotors); meV resolution is a setting; the in-line beamstop is HRM-1 | new confirm |
|
HighResolutionEnergy |
PseudoAxis |
confirm: hrmE virtual energy axis; linear crystal-translation-to-energy mapping (constants from the legacy SPEC file); MONO-1 |
high-resolution incident-energy pseudo-axis over HRM2; the meV energy-transfer scan axis (MONO-1) | new confirm |
|
SecondarySourceAperture |
Slit |
XF:10IDB-OP{SSA:1 |
secondary source aperture; two driven blades = a Slit despite the aperture label (fxi / hxn / srx precedent); OPT-2 | new confirm |
Transport¶
The transport slit, the support table, and the second beam-position monitor.
Enclosure: 10-ID-C.
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
TransportSlit |
Slit |
XF:10IDC-OP{Slt:4 |
transport beam-defining slit (OPT-2) | new confirm |
|
Table |
Table |
XF:10IDC-OP{Tbl:1 |
support / positioning table; axis set is an Asset-layer setting | new confirm |
|
BeamPositionMonitor_C |
BeamPositionMonitor |
XF:10IDC-OP{BPM:2 |
10-ID-C beam-position monitor (x/y + diagnostic foil); DIAG-1/BPM-1 | new confirm |
Endstation optics¶
The KB refocusing mirrors, the endstation slit, the focusing pinhole, the absorber wheel, and the multi-axis optics manipulator.
Enclosure: 10-ID-D.
Note
vfm / hfm are the vertical / horizontal KB focusing mirrors; orientation is a setting (the SIX Mirror precedent covers even hexapod-mounted mirrors). mcm is a six-DOF coupled manipulator = catalog Hexapod (MCM-1).
| Name | Family | PV | Key specs | Replaceable | Status |
|---|---|---|---|---|---|
VerticalFocusingMirror |
Mirror |
XF:10IDD-OP{VFM:1 |
vertical KB focusing mirror; coatings / bend are OPT-1 | new confirm |
|
HorizontalFocusingMirror |
Mirror |
XF:10IDD-OP{HFM:1 |
horizontal KB focusing mirror; coatings / bend are OPT-1 | new confirm |
|
EndstationSlit |
Slit |
XF:10IDD-OP{Slt:5 |
endstation beam-defining slit (OPT-2) | new confirm |
|
Pinhole |
Aperture |
ux: XF:10IDD-OP{Pinh:1-Ax:UX}Mtruy: XF:10IDD-OP{Pinh:1-Ax:UY}Mtrdx: XF:10IDD-OP{Pinh:1-Ax:DX}Mtrdy: XF:10IDD-OP{Pinh:1-Ax:DY}Mtr |
positioned focusing pinhole; Aperture (fxi / 9-id round-opening precedent) vs catalog Mask (plain fixed opening) is PH-1 | new confirm |
|
AbsorberWheel |
Filter |
XF:10IDD-OP{Abs:1-Ax:Wheel}Mtr |
discrete absorber-foil wheel; the catalog Filter covers attenuators (i03 / i15-1 precedent), wheel-vs-paddle is a setting | new confirm |
|
OpticsManipulator |
Hexapod |
x: XF:10IDD-OP{MCM:1-Ax:X}Mtry: XF:10IDD-OP{MCM:1-Ax:Y}Mtrz: XF:10IDD-OP{MCM:1-Ax:Z}Mtrrx: XF:10IDD-OP{MCM:1-Ax:Rx}Mtrry: XF:10IDD-OP{MCM:1-Ax:Ry}Mtrrz: XF:10IDD-OP{MCM:1-Ax:Rz}Mtr |
six-DOF coupled optics manipulator (MCM); a parallel-kinematics Hexapod (hxn / i15-1 / 9-id precedent). If the axes are independent serial rotations the read weakens (MCM-1) | new confirm |