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Source

The incident beam, produced, conditioned, and defined before the sample. A walk along the source-stage devices; the sample and detection stages are documented as their own composed-fixture pages, the controllers that drive these devices are on the Controls page, and the supplies they draw on are in Operations. Each device pairs its human name with the EPICS handle, its key specs, and whether it is field replaceable. new marks a device not yet modeled in CORA; confirm marks a value taken from the docs that staff have not yet verified.

Generated from the descriptor

This page is generated from the descriptor at deployments/cms/beamline.yaml. Edit the descriptor, not this page. For the CORA Asset model, settings, vendor catalog, drawings, and wiring, see Inventory.

Property Value
Facility nsls2
Sector 11-BM
Tier Unit
Source bending-magnet (confirm: 11-BM is a bending-magnet (or three-pole-wiggler) source; the profile collection does not expose the source as a device, so the source detail is SRC-1)

Enclosures

Enclosure Role Facility Permit signal
cms-optics optics-hutch nsls2 confirm: PSS permit leaf not in the profile collection; the first optics enclosure (XF:11BMA), hutch grouping is ENC-1 (PSS-1)
cms-endstation experiment-hutch nsls2 confirm: PSS permit leaf unknown; the scattering / reflectivity endstation (XF:11BMB), ENC-1 (PSS-1)

Machine

The machine-level source state, observed not driven.

Enclosure: cms-optics.

Note

Observe-only NSLS-II machine state, the loose StorageRing pattern reused from the NSLS-II siblings. 11-BM is a bending-magnet source, not an insertion device, so no InsertionDevice Asset (SRC-1, MACHINE-1).

Name Family PV Key specs Replaceable Status
StorageRing StorageRing confirm: NSLS-II storage-ring state (current, fill, status); observe-only, the exact PVs are MACHINE-1 NSLS-II storage-ring state; observe-only; the 11-BM bending-magnet source detail is SRC-1 (MACHINE-1) new confirm

Optics

The double-multilayer monochromator, the focusing mirrors, the FOE slit and attenuator, and the incident-energy axis.

Enclosure: cms-optics.

Note

The DMM binds Monochromator (the 2-BM double-multilayer precedent, a multilayer Bragg optic, not the soft X-ray GratingMonochromator). The mirrors bind Mirror, the slit binds Slit, the attenuator foils bind Filter, and the incident energy is a PseudoAxis over the DMM Bragg angle.

Name Family PV Key specs Replaceable Status
Monochromator Monochromator XF:11BMA-OP{Mono:DMM-Ax:Bragg}Mtr double-multilayer monochromator (DMM): Bragg angle sets the energy, with second-multilayer pitch / roll / offset (P2 / R2 / Y2) alignment sub-axes; the d-spacing and energy range are MONO-1 new confirm
ToroidalMirror Mirror XF:11BMA-OP{Mir:Tor-Ax:UB}Mtr FOE toroidal focusing mirror (X / Y alignment plus the UB bender setting the curvature); coating and bend are OPT-1 new confirm
EllipticalMirror Mirror XF:11BM1-OP{MDrive:1}Mtr the newer 1D elliptical focusing mirror on its MDrive controller (pitch / x / z); coating is OPT-1 new confirm
FoeSlit Slit XF:11BMA-OP{Slt:0-Ax:XGap}Mtr the FOE four-blade defining slit (T / B / O / I with virtual center / gap); blade-axis map is OPT-2 new confirm
AttenuatorFoils Filter XF:11BMB-OP{Fltr:1}Pos-Sts the eight pneumatic absorber foils (Fltr:1-8, in / out) that set transmission, important for the high dynamic range of reflectivity; the foil set is ATTN-1 new confirm
BeamEnergy PseudoAxis confirm: incident-energy virtual axis (calibrations near 13.5 keV) over the DMM Bragg angle (lambda = 2 d sin(Bragg)); the partition rule and d-spacing are MONO-1 incident-energy pseudo-axis over the DMM (the 2-BM beam-energy pattern); MONO-1 new confirm
FoeFluxMonitor FluxMonitor confirm: the FOE quad electrometers (bim1 / bim2 on XF:11BMA-BI{IM:1}) reading incident flux; the channel map is DET-1 FOE incident-flux monitors (quad electrometers); scalar current readings (DET-1) new confirm